Preparation and Characterization of TiO2/CdS Layers as Potential Photoelectrocatalytic Materials

Authors

DOI:

https://doi.org/10.70594/

Keywords:

Titanium dioxide, Cadmium sulphide, Photocatalyst

Abstract

The TiO2/CdS semiconductor composites were prepared on indium tin oxide (ITO) substrates in di®erent mass proportions via wet-chemical techniques using bi-distilled water, acetyl-acetone, poly-propylene-glycol and Triton X-100 as additives. The composite layers were annealed in normal conditions at the temperature of 450±C, 120 min. with a rate of temperature increasing of 5±C/min. The structural and optical properties of all the TiO2/CdS ayers were characterized by X-ray di®raction, UV-VIS spectroscopy, spectrofluorimetry and FT/IR microscopy. The microstructural properties of the deposited TiO2/CdS layers can be modi¯ed by varying the mass proportions of TiO2:CdS. The good crystallinity level and the high optical adsorption of the TiO2/CdS layers make them attractive for photoelectrochemical cell applications.

Author Biographies

  • Marcela-Corina Rosu, National Institute for Research and Development of Isotopic and Molecular Technologies, Romania

    Department of Physics of Nanostructured Systems
    National Institute for Research and Development of Isotopic and Molecular Technologies, Romania

  • Ramona-Crina Suciu, National Institute for Research and Development of Isotopic and Molecular Technologies, Romania

    Department of Physics of Nanostructured Systems
    National Institute for Research and Development of Isotopic and Molecular Technologies, Romania

  • Simina-Virginia Dreve, National Institute for Research and Development of Isotopic and Molecular Technologies, Romania

    Department of Physics of Nanostructured Systems
    National Institute for Research and Development of Isotopic and Molecular Technologies, Romania

  • Ioan Bratu, National Institute for Research and Development of Isotopic and Molecular Technologies, Romania

    Department of Physics of Nanostructured Systems
    National Institute for Research and Development of Isotopic and Molecular Technologies, Romania

  • Teofil-Danut Silipas, National Institute for Research and Development of Isotopic and Molecular Technologies, Romania

    Department of Physics of Nanostructured Systems
    National Institute for Research and Development of Isotopic and Molecular Technologies, Romania

  • Emil Indrea, National Institute for Research and Development of Isotopic and Molecular Technologies, Romania

    Department of Physics of Nanostructured Systems
    National Institute for Research and Development of Isotopic and Molecular Technologies, Romania

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Published

2025-07-25